✦ LIBER ✦

Ultrathin SiO2 films on Si formed by N2O-plasma oxidation technique

✍ Scribed by Atsushi Masuda; Yasuto Yonezawa; Akiharu Morimoto; Minoru Kumeda; Tatsuo Shimizu

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

XPS analysis of ultrathin SiO2 film grow

✍ S. Ichimura; K. Koike; A. Kurokawa; K. Nakamura; H. Itoh 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 97 KB

XPS analysis of carrier trapping phenome

✍ K Hirose; S Kawashiri; T Hattori 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 110 KB

Low temperature plasma-assisted oxidatio

✍ G. Lucovsky; T. Yasuda; Y. Ma; S. Habermehl; S.S. He; D.J. Stephens 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 774 KB

Reaction products and oxide thickness fo

✍ Changhong Chen; Dexiu Huang; Weiguang Zhu; Yi Feng; Xigang Wu 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 285 KB

Ta2Si short time thermal oxidized layers

✍ A. Pérez-Tomás; N. Mestres; P. Godignon; J. Montserrat; J. Millán 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 653 KB

Chemical and electrical characteristics

✍ Juho Song; G.S. Lee; P.K. Ajmera 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 506 KB