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Chemical and electrical characteristics of low temperature plasma enhanced CVD silicon oxide films using Si2H6 and N2O

✍ Scribed by Juho Song; G.S. Lee; P.K. Ajmera

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 506 KB
Volume: 270
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(95)06746-9

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