(Me5C5)SiH3 and (Me5C5)2SiH2 as precursors for low-temperature remote plasma-enhanced CVD of thin Si3N4 and SiO2 films

✍ Scribed by Jürgen Dahlhaus; Prof. Peter Jutzi; Dr. Hubert-Joachim Frenck; Dr. Wilhelm Kulisch

• Publisher: John Wiley and Sons
• Year: 1993
• Tongue: English
• Weight: 469 KB
• Volume: 5
• Category: Article
• ISSN: 0935-9648
• DOI: 10.1002/adma.19930050510