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Room-temperature, high-deposition-rate, plasma-enhanced chemical vapour deposition of silicon oxynitride thin films producing low surface damage on lattice-matched and pseudomorphic III–V quantum-well structures

✍ Scribed by R.E. Sah; J.D. Ralston; G. Eichin; B. Dischler; W. Rothemund; J. Wagner; E.C. Larkins; H. Baumann


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
583 KB
Volume
259
Category
Article
ISSN
0040-6090

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