Low temperature plasma-assisted oxidation and thin-film deposition processes for forming device-quality SiO2/Si and composite dielectric-SiO2/Si heterostructures

✍ Scribed by G. Lucovsky; T. Yasuda; Y. Ma; S. Habermehl; S.S. He; D.J. Stephens

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 774 KB
• Volume: 220
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(92)90545-m