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XPS analysis of ultrathin SiO2 film growth on Si by ozone

✍ Scribed by S. Ichimura; K. Koike; A. Kurokawa; K. Nakamura; H. Itoh

Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
97 KB
Volume
30
Category
Article
ISSN
0142-2421

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