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Ultrascaled InAlN/GaN High Electron Mobility Transistors with Cutoff Frequency of 400 GHz

โœ Scribed by Yue, Yuanzheng; Hu, Zongyang; Guo, Jia; Sensale-Rodriguez, Berardi; Li, Guowang; Wang, Ronghua; Faria, Faiza; Song, Bo; Gao, Xiang; Guo, Shiping; Kosel, Thomas; Snider, Gregory; Fay, Patrick; Jena, Debdeep; Xing, Huili Grace


Book ID
121871448
Publisher
Institute of Pure and Applied Physics
Year
2013
Tongue
English
Weight
753 KB
Volume
52
Category
Article
ISSN
0021-4922

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The structure of InAlN/GaN heterostructu
โœ Vilalta-Clemente, A. ;Poisson, M. A. ;Behmenburg, H. ;Giesen, C. ;Heuken, M. ;Ru ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 462 KB

## Abstract In the investigated InAlN/GaN layers, it is shown that the surface morphology and the crystallinity of the alloy critically depend on the In composition. Atomic force microscopy analysis points out that step flow growth is not easily attained in this system. When the InAlN or AlN interl