Transport properties of SiO 2 /AlInN/AlN/GaN metal–oxide–semiconductor high electron mobility transistors on SiC substrate
✍ Scribed by Lachab, M; Sultana, M; Fareed, Q; Husna, F; Adivarahan, V; Khan, A
- Book ID
- 126476617
- Publisher
- Institute of Physics
- Year
- 2014
- Tongue
- English
- Weight
- 586 KB
- Volume
- 47
- Category
- Article
- ISSN
- 0022-3727
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
## Abstract Metal–oxide–semiconductor high‐electron‐mobility transistors were demonstrated on AlGaN/GaN with electron beam (EB) evaporated ZrO~2~. The composition of the EB deposited ZrO~2~ thin films was confirmed using X‐ray photoelectron spectroscopy (XPS). The fabricated ZrO~2~‐based MOSHEMTs e
## Abstract We report on the fabrication of AlGaN/GaN double‐insulator MOSHEMTs using SiO~2~ and SiN as the prime gate insulators. Both the dielectrics showed enhanced saturation current density and pinch‐off voltage compared to conventional HEMTs. The SiO~2~/SiN/AlGaN/GaN MOSHEMTs exhibited a low