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Explanation of threshold voltage scaling in enhancement-mode InAlN/AlN–GaN metal oxide semiconductor high electron mobility transistors on Si substrates

✍ Scribed by A. Alexewicz; C. Ostermaier; C. Henkel; O. Bethge; J.-F. Carlin; L. Lugani; N. Grandjean; E. Bertagnolli; D. Pogany; G. Strasser


Book ID
113937740
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
389 KB
Volume
520
Category
Article
ISSN
0040-6090

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