Transistor mismatch in 32 nm high-k metal-gate process

✍ Scribed by Yuan, X.; Shimizu, T.; Mahalingam, U.; Brown, J.S.; Habib, K.; Tekleab, D.G.; Su, T.-C.; Satadru, S.; Olsen, C.M.; Lee, H.; Pan, L.-H.; Hook, T.B.; Han, J.-P.; Park, J.-E.; Na, M.-H.; Rim, K.

• Book ID: 118181528
• Publisher: The Institution of Electrical Engineers
• Year: 2010
• Tongue: English
• Weight: 276 KB
• Volume: 46
• Category: Article
• ISSN: 0013-5194
• DOI: 10.1049/el.2010.0343