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SiGe channels for VT control of high-k metal gate transistors for 32 nm complementary metal oxide semiconductor technology and beyond

✍ Scribed by Carsten Reichel; Joerg Schoenekess; Stephan Kronholz; Gunda Beernink; Annekathrin Zeun; Andreas Dietel; Thorsten Kammler

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Implementation of high-k and metal gate

✍ S. Beckx; M. Demand; S. Locorotondo; K. Henson; M. Claes; V. Paraschiv; D. Shami 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 275 KB

Control of topography and morphology for

✍ Carsten Reichel; Stephan Kronholz; Thorsten Kammler; Annekathrin Zeun; Gunda Bee 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 772 KB

SiGe channels for VT control of high-k metal gate transistors for 32&#xa0;nm complementary metal oxide semiconductor technology and beyond