✦ LIBER ✦
Implementation of high-k and metal gate materials for the 45 nm node and beyond: gate patterning development
✍ Scribed by S. Beckx; M. Demand; S. Locorotondo; K. Henson; M. Claes; V. Paraschiv; D. Shamiryan; P. Jaenen; W. Boullart; S. Degendt; S. Biesemans; S. Vanhaelemeersch; J. Vertommen; B. Coenegrachts
- Book ID
- 108210518
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 275 KB
- Volume
- 45
- Category
- Article
- ISSN
- 0026-2714
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