✦ LIBER ✦
Control of topography and morphology for channel SiGe by in-situ HCl etching for future CMOS technologies with high-K metal gate
✍ Scribed by Carsten Reichel; Stephan Kronholz; Thorsten Kammler; Annekathrin Zeun; Gunda Beernink
- Book ID
- 108271850
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 772 KB
- Volume
- 60
- Category
- Article
- ISSN
- 0038-1101
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