Improved high-temperature etch processing of high-k metal gate stacks in scaled TANOS memory devices

✍ Scribed by J. Paul; V. Beyer; M. Czernohorsky; M.F. Beug; K. Biedermann; M. Mildner; P. Michalowski; E. Schütze; T. Melde; S. Wege; R. Knöfler; T. Mikolajick

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 557 KB
• Volume: 87
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2009.10.030