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Thermal annealing effect of silicon nitride film deposited by photo-CVD

✍ Scribed by Yasushi Deguchi; Michio Ohnishi; Yoshihiro Takahashi; Kazunori Ohnishi

Publisher: John Wiley and Sons
Year: 1997
Tongue: English
Weight: 247 KB
Volume: 80
Category: Article
ISSN: 8756-663X
DOI: 10.1002/(sici)1520-6432(199711)80:11<30::aid-ecjb4>3.0.co;2-v

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