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The deposition of aluminum nitride thin films by metal-organic CVD—an alternative precursor system

✍ Scribed by Dr. Anthony C. Jones; John Auld; Simon A. Rushworth; Prof. Edward W. Williams; Dr. Peter W. Haycock; Dr. Chiu C. Tang; Dr. Gary W. Critchlow


Publisher
John Wiley and Sons
Year
1994
Tongue
English
Weight
395 KB
Volume
6
Category
Article
ISSN
0935-9648

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