✦ LIBER ✦
The dependence of etch rate of photo-CVD silicon nitride films on NH4F content in buffered HF
✍ Scribed by V.K. Rathi; Manju Gupta; O.P. Agnihotri
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 303 KB
- Volume
- 26
- Category
- Article
- ISSN
- 0026-2692
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