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The Effect of Pad-asperity Curvature on Material Removal Rate in Chemical-mechanical Polishing

✍ Scribed by Kim, Sanha; Saka, Nannaji; Chun, Jung-Hoon

Book ID: 124145814
Publisher: Elsevier
Year: 2014
Tongue: English
Weight: 923 KB
Volume: 14
Category: Article
ISSN: 2212-8271
DOI: 10.1016/j.procir.2014.03.014

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