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Modeling effect of chemical–mechanical synergy on material removal at molecular scale in chemical mechanical polishing

✍ Scribed by Yongguang Wang; Yongwu Zhao; Jianzhong Jiang; Xufang Li; Jing bai

Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 490 KB
Volume: 265
Category: Article
ISSN: 0043-1648
DOI: 10.1016/j.wear.2008.01.001

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