✦ LIBER ✦
Modeling the effects of oxidizer, complexing agent and inhibitor on material removal for copper chemical mechanical polishing
✍ Scribed by Yongguang Wang; Yongwu Zhao
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 314 KB
- Volume
- 254
- Category
- Article
- ISSN
- 0169-4332
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