✦ LIBER ✦

Research on the molecular scale material removal mechanism in chemical mechanical polishing

✍ Scribed by Wang, YongGuang ;Zhao, YongWu

Book ID: 107368453
Publisher: Elsevier
Year: 2008
Tongue: English
Weight: 669 KB
Volume: 53
Category: Article
ISSN: 2095-9273
DOI: 10.1007/s11434-008-0268-7

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