✦ LIBER ✦

The Chemical Vapour Deposition of Tantalum

✍ Scribed by Drs. D. J. Jerreat; Rees D. Rawlings

Publisher: John Wiley and Sons
Year: 1974
Tongue: English
Weight: 485 KB
Volume: 9
Category: Article
ISSN: 0232-1300
DOI: 10.1002/crat.19740090905

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✦ Synopsis

Abstract

The effect of the total pressure, feed temperature, deposition temperature, and reaction tube inclination and geometry on the chemical vapour deposition of tantalum from the pentaiodide has been investigated. Transport rates as high as 350 mg hr^−1^ were achieved in inclined tubes of specific geometry with a feed temperature of 650°C and a deposition temperature of 1200°C. The dependence of the transport rate on the total pressure, and the feed and deposition temperatures has been analysed and suggestions made as to the rate controlling processes.

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