Composition, microstructure and mechanical properties of chemically vapour-deposited tantalum

✍ Scribed by Dr. D. J. Jerreat; Dr. Rees D. Rawlings

• Publisher: John Wiley and Sons
• Year: 1976
• Tongue: English
• Weight: 557 KB
• Volume: 11
• Category: Article
• ISSN: 0232-1300
• DOI: 10.1002/crat.19760110806

✦ Synopsis

Abstract

The paper reports the results of a structural investigation of C.V.D. tantalum, which had been deposited on a silica substrate. Deposits at 1000°C were high impurity powders or flakes, at 1100°C (normal deposition temperature) foil‐like, these containing much lower silicon contents, being concentrated near the substrate and coming from there by diffusion. The overall silicon content is reported to be due to other kinds of mass transport (i. e. vapour phase transport) and reactions (e.g. Ta with quartz). — Details on the structure and hardness of the Ta layers are given.