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Chemical vapour deposition polymerization of substituted [2.2]paracyclophanes

✍ Scribed by Jörg Lahann; Doris Klee; Hartwig Höcker

Publisher
John Wiley and Sons
Year
1998
Tongue
English
Weight
440 KB
Volume
19
Category
Article
ISSN
1022-1336

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✦ Synopsis

Chemical vapour deposition polymerisation of substituted [2.2]paracyclophanes is applied to the functionalised coating of stainless steel surfaces. Poly[o-trifluoroacetyl-p-xylylene-co-p-xylylene] (2a), ~ly[o-hydroxymethyl-p-xylylene-c~-p-xylylene] (2b), poly[o-a~no-p-xylylene-co-p-xylylene] (2c) and poly~-xylylene-2,3-dicarboxylic anhydride) (2 d) were deposited as thin layers.

📜 SIMILAR VOLUMES

The Radical Anions of Some Substituted [
The Radical Anions of Some Substituted [2.2]Paracyclophanes
✍ Peter Fürderer; Fabian Gerson; Hiroaki Ohya-Nishiguchi; Ingrid Böhm; Henning Hop 📂 Article 📅 1979 🏛 John Wiley and Sons 🌐 German ⚖ 379 KB

## Abstract The radical anions of the following substituted [2.2]paracyclophanes have been characterized by ESR. and ENDOR. spectroscopy: 4, 16‐dicyano‐ (**__o__**‐**2**), 4, 12‐dicyano‐ (**__p__**‐**2**), 4,5,12,13‐tetracyano‐ (**3**) and 4,5,12,13‐tetrakis (alkoxycarbonyl)‐ [2.2]paracyclophanes (

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