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Atmospheric Pressure Chemical Vapour Deposition of NbSe2 Thin Films on Glass

✍ Scribed by Nicolas D. Boscher; Claire J. Carmalt; Ivan P. Parkin

Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
176 KB
Volume
2006
Category
Article
ISSN
1434-1948

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Atmospheric pressure (AP) CVD of TiSe 2 films on glass substrates was achieved by reaction of di-tert-butylselenide and diethyl diselenide with TiCl 4 at 250-600 Β°C. All the films showed a TiSe 2 Raman pattern with bands at 133 cm -1 and 198 cm -1 . X-ray diffraction (XRD) showed that the TiSe 2 fil

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