Atmospheric Pressure CVD of TiSe2 Thin Films on Glass
✍ Scribed by N. D. Boscher; C. J. Carmalt; I. P. Parkin
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 341 KB
- Volume
- 12
- Category
- Article
- ISSN
- 0948-1907
No coin nor oath required. For personal study only.
✦ Synopsis
Atmospheric pressure (AP) CVD of TiSe 2 films on glass substrates was achieved by reaction of di-tert-butylselenide and diethyl diselenide with TiCl 4 at 250-600 °C. All the films showed a TiSe 2 Raman pattern with bands at 133 cm -1 and 198 cm -1 . X-ray diffraction (XRD) showed that the TiSe 2 films were crystalline with cell constants close to those expected: some preferred orientation was noted at higher deposition temperatures. Energy dispersive analysis by X-rays (EDAX) gave a Ti:Se ratio close to 1:2 for all the films formed at 550 °C, and a Ti:Se ratio close to 1:1.5 for the film formed at 600 °C. The TiSe 2 films produced from diethyl diselenide and TiCl 4 had a powdery, purple, matte appearance whilst reaction with di-tert-butylselenide formed navy-blue reflective films at deposition temperatures below 300 °C, and dark-purple films at deposition temperatures above 350 °C. Scanning electron microscopy (SEM) showed that the films were composed of needle-like crystals which became longer and thicker with increasing deposition temperature. After 60 days storage in air, Raman spectra of the films produced from diethyl diselenide and TiCl 4 revealed the presence of TiO 2 , whereas no change was noticed in the XRD and Raman spectra of the films produced from di-tert-butylselenide and TiCl 4 .
📜 SIMILAR VOLUMES