✦ LIBER ✦
Atmospheric pressure chemical vapour deposition of WO3 thin films from a volatile fluorinated tungsten oxo-alkoxide precursor, W(O)(OCH2CF3)4
✍ Scribed by K. C. Molloy; P. A. Williams
- Publisher
- John Wiley and Sons
- Year
- 2008
- Tongue
- English
- Weight
- 163 KB
- Volume
- 22
- Category
- Article
- ISSN
- 0268-2605
- DOI
- 10.1002/aoc.1439
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✦ Synopsis
Abstract
The monomeric tungsten oxo‐fluoroalkoxide W(O)(CH~2~CF~3~)~4~ (1) was synthesized from W(O)Cl~4~ and CF~3~CH~2~OH in the presence of ammonia. It was used in atmospheric pressure chemical vapour deposition experiments to deposit non‐stoichiometric WO~2.9~ when used as a single‐source precursor or stoichiometric WO~3~ when O~2~ was used as co‐reagent. Copyright © 2008 John Wiley & Sons, Ltd.