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Atmospheric Pressure Chemical Vapour Deposition of TiCl4 and tBuAsH2 to Form Titanium Arsenide Thin Films

✍ Scribed by Tegan Thomas; Christopher S. Blackman; Ivan P. Parkin; Claire J. Carmalt

Publisher: John Wiley and Sons
Year: 2010
Tongue: English
Weight: 474 KB
Volume: 2010
Category: Article
ISSN: 1434-1948
DOI: 10.1002/ejic.201000839

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