Filament-activated chemical vapour deposition of nitride thin films

✍ Scribed by Sadanand V. Deshpande; Jeffrey L. Dupuie; Erdogan Gulari

• Publisher: John Wiley and Sons
• Year: 1996
• Tongue: English
• Weight: 987 KB
• Volume: 6
• Category: Article
• ISSN: 1616-301X
• DOI: 10.1002/(sici)1099-0712(199605)6:3<135::aid-amo221>3.0.co;2-4

✦ Synopsis

We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tungsten filament (1500-1850°C) was utilised to decompose ammonia in order to deposit nitride films at low substrate temperatures and high rates. The substrate temperatures ranged from 245 to 600°C. The film properties were characterised by a number of analytical and optical methods. The effect of various deposition conditions on film properties was studied. All the films obtained were of high chemical purity and had very low cr no detectable tungsten contamination from the filament metal.