UV Moderation of Nitride Films during Remote Plasma Enhanced Chemical Vapour Deposition

✍ Scribed by Butcher, K.S.A. ;Afifuddin, ;Chen, P.P.-T. ;Goldys, E.M. ;Tansley, T.L.

• Publisher: John Wiley and Sons
• Year: 2001
• Tongue: English
• Weight: 85 KB
• Volume: 188
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/1521-396x(200112)188:2<667::aid-pssa667>3.0.co;2-s