𝔖 Bobbio Scriptorium
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Chemical and plasmachemical vapour deposition of aluminium nitride layers

✍ Scribed by Prof. Dr. H. Arnold; Dipl.-Chem. L. Biste; Dipl.- Ing. D. Bolze; Dr. G. Eichhorn

Publisher
John Wiley and Sons
Year
1976
Tongue
English
Weight
281 KB
Volume
11
Category
Article
ISSN
0232-1300

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✦ Synopsis

Abstract

AIN was deposited pyrolytically by means of the aluminium trichloride‐ammonia process (either introducing both compounds seperately or in complex form) and by plasmachemical reaction of aluminium trichloride with nitrogen at temperatures from 600 to 1300Β°C. Layers deposited onto (100) spinel had an epitaxial (0001) orientation, whereas fibre textures resulted on silicon and quartz glass.

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