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Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resist

✍ Scribed by Vitor R. Manfrinato; Lin Lee Cheong; Huigao Duan; Donald Winston; Henry I. Smith; Karl K. Berggren

Book ID: 113797849
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 671 KB
Volume: 88
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2011.05.024

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