Determination of proximity effect parameters by means of CD-linearity in sub 100 nm electron beam lithography

✍ Scribed by M. Hauptmann; K.-H. Choi; P. Jaschinsky; C. Hohle; J. Kretz; L.M. Eng

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 487 KB
• Volume: 86
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2008.12.053