Low energy electron beam lithography: Pa
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V.A. Kudryashov; V.V. Krasnov; P.D. Prewett; T.J. Hall
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Article
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1997
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Elsevier Science
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English
โ 296 KB
Experimental investigation of low voltage be,'un deflection during thick PMMA resist layer exposure was carried out and a simple mathematical model of the process has been developed.