Low energy electron beam lithography: Pattern distortion by charge trapped in the resist

✍ Scribed by V.A. Kudryashov; V.V. Krasnov; P.D. Prewett; T.J. Hall

• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 296 KB
• Volume: 35
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(96)00082-2

✦ Synopsis

Experimental investigation of low voltage be,'un deflection during thick PMMA resist layer exposure was carried out and a simple mathematical model of the process has been developed.