Superiority of Langmuir-Blodgett resist films in electron beam lithography as demonstrated by the backscattering yield

✍ Scribed by W. Lu; H.Y. Shen; N. Gu; C.W. Yuan; Z.H. Lu; Y. Wei

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 775 KB
• Volume: 243
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(93)04149-m