Electron beam lithography at 10 keV using an epoxy based high resolution negative resist

✍ Scribed by C. Martin; G. Rius; A. Llobera; A. Voigt; G. Gruetzner; F. Pérez-Murano

• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 964 KB
• Volume: 84
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2007.01.035