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Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

✍ Scribed by Yang, Joel K. W.; Cord, Bryan; Duan, Huigao; Berggren, Karl K.; Klingfus, Joseph; Nam, Sung-Wook; Kim, Ki-Bum; Rooks, Michael J.

Book ID: 121311424
Publisher: AVS (American Vacuum Society)
Year: 2009
Tongue: English
Weight: 853 KB
Volume: 27
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.3253652

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