Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist

✍ Scribed by Duan, Huigao ;Winston, Donald ;Yang, Joel K. W. ;Cord, Bryan M. ;Manfrinato, Vitor R. ;Berggren, Karl K.

• Book ID: 120259772
• Publisher: AVS (American Vacuum Society)
• Year: 2010
• Tongue: English
• Weight: 649 KB
• Volume: 28
• Category: Article
• ISSN: 1520-8567
• DOI: 10.1116/1.3501353