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10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist

✍ Scribed by Robinson, A P G; Palmer, R E; Tada, T; Kanayama, T; Allen, M T; Preece, J A; Harris, K D M

Book ID: 120346590
Publisher: Institute of Physics
Year: 1999
Tongue: English
Weight: 171 KB
Volume: 32
Category: Article
ISSN: 0022-3727
DOI: 10.1088/0022-3727/32/16/102

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