✦ LIBER ✦
Nanometer and high aspect ratio patterning by electron beam lithography using a simple DUV negative tone resist
✍ Scribed by H. Elsner; H.-G. Meyer
- Book ID
- 114155302
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 438 KB
- Volume
- 57-58
- Category
- Article
- ISSN
- 0167-9317
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