A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

✍ Scribed by T. Tada; T. Kanayama; A.P.G. Robinson; R.E. Palmer; M.T. Allen; J.A. Preece; K.D.M. Harris

• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 601 KB
• Volume: 53
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(00)00348-8

✦ Synopsis

We show that a triphenylene derivative, 2,3,6,7,10,11-hexapentyl-oxytriphenylene, acts as an electron beam resist of 10-nm resolution with high dry-etch durability. The triphenylene derivative exhibited positive and negative behaviors depending on the dose and developers. When pentanol was used as a developer, positive behavior was observed for electron doses between ~ 3 x 10 .4 and ~ 1 x 10 3 C/cm 2 at 20 keV, and at higher doses, the resist cxhibited negative behavior. When monochlorobenzene was used as a developer, only the negative behavior was observed with a sensitivity of 2x 10 -3 C/cm 2 at 20 keV. Performance of the resists were demonstrated defining 10nm dots and lines (negative tone), and fabricating a high aspect-ratio Si nanostructure with a single layer process.