✦ LIBER ✦
Formation, Characterization, and Sub-50-nm Patterning of Organosilane Monolayers with Embedded Disulfide Bonds: An Engineered Self-Assembled Monolayer Resist for Electron-Beam Lithography
✍ Scribed by Wang, Xuejun; Hu, Wenchuang; Ramasubramaniam, Rajagopal; Bernstein, Gary H.; Snider, Gregory; Lieberman, Marya
- Book ID
- 127080753
- Publisher
- American Chemical Society
- Year
- 2003
- Tongue
- English
- Weight
- 988 KB
- Volume
- 19
- Category
- Article
- ISSN
- 0743-7463
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