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Stress hysteresis and mechanical properties of plasma-enhanced chemical vapor deposited dielectric films

✍ Scribed by Thurn, Jeremy; Cook, Robert F.; Kamarajugadda, Mallika; Bozeman, Steven P.; Stearns, Laura C.


Book ID
111889510
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
366 KB
Volume
95
Category
Article
ISSN
0021-8979

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