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Thermal Annealing Effects on the Mechanical Properties of Plasma-Enhanced Chemical Vapor Deposited Silicon Oxide Films

✍ Scribed by Schliwinski, H. -J.

Book ID: 126694555
Publisher: The Electrochemical Society
Year: 1992
Tongue: English
Weight: 749 KB
Volume: 139
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.2069484

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