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Silicon nanocrystal formation in annealed silicon-rich silicon oxide films prepared by plasma enhanced chemical vapor deposition

✍ Scribed by Daldosso, N.; Das, G.; Larcheri, S.; Mariotto, G.; Dalba, G.; Pavesi, L.; Irrera, A.; Priolo, F.; Iacona, F.; Rocca, F.

No coin nor oath required. For personal study only.

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