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Soft landing of silicon nanocrystals in plasma enhanced chemical vapor deposition

✍ Scribed by Chaabane, Nihed; Suendo, Veinardi; Vach, Holger; Roca i Cabarrocas, Pere

Book ID: 118280746
Publisher: American Institute of Physics
Year: 2006
Tongue: English
Weight: 631 KB
Volume: 88
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2204439

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