Phenomenological model of nanocrystalline silicon film formation by plasma-enhanced chemical vapor deposition

✍ Scribed by P. L. Novikov; A. Le Donne; S. Cereda; L. Miglio; S. Pizzini; S. Binetti; M. Rondanini; C. Cavallotti; D. Chrastina; T. Moiseev; H. von Känel; G. Isella; F. Montalenti

• Book ID: 111511009
• Publisher: Allerton Press Inc
• Year: 2009
• Tongue: English
• Weight: 397 KB
• Volume: 45
• Category: Article
• ISSN: 8756-6990
• DOI: 10.3103/s8756699009040062