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Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition

✍ Scribed by Atif Mossad Ali; Takao Inokuma; Seiichi Hasegawa

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 455 KB
Volume: 253
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2006.01.064

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