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Growth and characterization of silicon-nitride films by plasma-enhanced chemical vapor deposition

✍ Scribed by I.K. Han; Y.J. Lee; J.W. Jo; J.I. Lee; K.N. Kang


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
310 KB
Volume
48-49
Category
Article
ISSN
0169-4332

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